LPCVD silicon nitride and other deposition services at LioniX International
LioniX deposit LPCVD silicon nitride and other high quality films of insulator and dielectric materials. We specialize in LPCVD services offering high purity layers with conformal growth in thicknesses up to one µm. The high temperatures involved in LPCVD processing make it incompatible with metals.
Available LPCVD services
LPCVD Silicon Nitride (Si3N4)
SiRN Low stress silicon nitride
LPCVD low stress nitride is used generally in nanofabrication as a masking material. As a low stress form of nitride it makes excellent membranes.
We control the material properties of our LPCVD polysilicon such a grain size and stress for a variety of applications. In MEMS applications polysilicon is mainly used as a structural layer Or as a masking layer for wet etching on fused silica substrates.
TEOS Silicon Dioxide SiO2
LPCVD TEOS provides excellent step coverage with high film quality. We offer this process step primarily for trench filling and top cladding.